Subsystem for Increased Uptime, Byproduct Buildup Reduction in WCVD Exhaust Lines

The new HPS Effluent Management Subsystem for Tungsten CVD can prevent the solidification of condensable byproducts and the chemical reaction that causes additional buildup.

The manufacturer states that by combining heat from HPS Series 45 heaters and a nitrogen purge from the patented Virtual Wall, this tungsten subsystem reduces clogging, and increases uptime and yield on Tungsten CVD (WCVD) systems.

Tungsten is a refractory metal used as a contact plug, vertical interconnection, or barrier on integrated circuits. However, a chemical reaction in the exhaust line between tungsten hexaflouride (WF₆) and water from the wet scrubber form tungsten oxiflourides and oxides. These byproducts clog the exhaust line and the scrubber inlet, requiring frequent maintenance, and are very toxic, resulting in safety issues in the line maintenance. According to the manufacturer, by heating the exhaust line from the pump, then installing a WCVD-specific Virtual Wall at the scrubber inlet, byproduct sublimation is reduced, increasing uptime and minimizing possible contact with the WF₆.

N/A, 5330 Sterling Drive, Boulder, CO 80301. Tel: 303-4499861. Fax: 303-442-6880.