Plasma Reactor

The CFS Plasma Reactor has been designed for use in the surface enhancement and semiconductor industries where a low volume research level of activity is required. Applications for this device include resist stripping, isotropic etching, ultra pure surface cleaning bio medical destruction and surface energy modifications. This bench mountable unit handles samples up to 180mm in diameter, and can be used to produce adhesive and wettable surfaces on materials such as silicon, ceramics, metals, glass and polymers.

Kurt J Lesker Company, 1515 Worthington Ave., Clairton, PA Phone: (800) 245-1656 Fax: (412) 233-4275