Ion-Beam Etching System

The EM RES 100 is a computer-controlled ion-beam etching system that offers integral video monitoring as standard equipment. All of the settings are performed by clicking the mouse or keyboard, and even complicated preparation sequences can be recorded, saved and recalled without difficulty for similar applications. It has two powerful ion sources that ensure short etching times, with minimal heat generation. The system also has a vacuum load lock system that ensures the rapid changeover of specimens and long source working life without sacrificing chamber vacuum.

Leica Microsystems Inc, 111 Deer Lake RD. Deerfield IL 60015 Phone: 800 248-0123 Fax: (847) 405-0147