Used either independently or in combination with a wafer loader in an automated system, this series is designed to view, image, and document wafers, photo masks, reticles, and a variety of substrates. The microscopes can accommodate wafers up to 8-in.-dia., and masks up to 6-in.-dia. In addition, the optical system is said to offer a very good combination of long working distances and high numerical apertures, even at the extremes of magnification, as well as produce images with exceptional edge to edge definition and signal-to-noise ratios.
The manufacturer's new LU plan objective allows the use of multiple observation techniques including brightfield, darkfield, and differential interference contrast (DIC), all with a single objective.
Additionally, the new microscopes exceed S2-93A and S8-95 standards, and are built according to strict ergonomic parameters. The microscope stands are very rigid for enhanced vibration resistance, and stand and eyepiece tubes are finished with electrostatic discharge (ESD) coatings to prevent the attraction of particles.
N/A, 1300 Walt Whitman Rd., Melville, NY 11747. Tel: 516-547-4200. Fax: 516-547-0307.