Gas and Pump Line Heating Systems for Semiconductor Plumbing

These new gas and pump line heating systems have been designed to meet the thermal challenges of semiconductor plumbing including poor conductivity of stainless steel, different thermal mass of plumbing components, or ambient temperature changes between the cleanroom and subfloor.

According to the manufacturer, the systems combine thermal components that optimize chemical vapor deposition (CVD), metal etch process performance, and process yields while reducing condensation, particle buildup, and maintenance-related downtime.

The systems are constructed from heaters, sensors, and controllers that meet UL, CE, NEC, and SEMI S2-93 safety requirements. They are well sited for such gas delivery line applications as boron tri-chloride, chlorine-trifloride, dichlorsilane, tetra ethyl orthosilicate, TI nitride, tungsten, and water vapor. They can also be used in pump lines for CVD and metal etching applications involving low-pressure chemical vapor deposition, aluminum etch, tungsten etch, and copper etch.

System features include:

• Even heating up to 200°for uniform temperature profiles over the heated line
• Electronic temperature controllers and software
• Cleanroom-compatible silicone rubber construction
• Optional 94-VO flame-retardant materials

Watlow Electric Manufacturing Company, 12001 Lackland Road, St. Louis, MO 63146. Tel: 314-878-4600. Fax: 314-878-2360.