AirSentry-IMS System

The company expands the capability of the AirSentry-IMS System to include Total Acids monitoring of airborne contaminants in DUV lithography.

The system is most widely used to monitor Total Amines, Ammonia and NMP contamination in the DUV fab. Real-time monitoring of these contaminants can improve resist uniformity, guarantee maximum filter life and reduce process downtime.

Acid gases are known to cause corrosion problems through the fab as well as fluorination and destabilization of the silicon surface. The addition of acids monitoring to the system gives the DUV lithographer the most complete real-time airborne contamination profile.

The company uses the proven technology of Ion Mobility Spectrometry (IMS) to perform continuous unattended measurements. IMS is a rapid, highly specific analytical method with sensitivity in the sub PPB concentration range. The system uses a unique rotary sampling system that allows from 1 to 45 sampling points to be programmed by the user. All data, events and alarms are continuously logged to an integrated Windows NT Workstation that presents current concentrations, sample trending and alarm status. A SECS/GEM communication package is available.

Molecular Analytics, 25 Loveton Circle, P.O. Box 1123, Sparks, MD 21152-1123. Tel: 410-472-2146; Fax: 410-472-2156.